型号Model

SU1510

国别、厂商Manufacturer

日本 日立

Hitachi Japan

性能指标

Performance index

分辨率：二次电子像分辨率：3.0 nm保证(高真空方式)；背散射电子像分辨率：4.0 nm保证(低真空方式)

Resolution: secondary electron image resolution: 3.0 nm (high vacuum mode); back scattering electron image resolution: 4.0 nm (low vacuum mode)

加速电压：0.3～30 KV（0.3～9.99 KV 10 V/步)；（10～30 KV 0.1 KV/步)

Accelerating voltage: 0.3～30 KV（0.3～9.99 KV  10 V/step)；（10～30 KV 0.1 KV/step)  

放大倍率：×5～×300,000

Magnification ratio: ×5～×300,000

最大样品尺寸：直径153 mm，高度60 mm (WD=15 mm)

Maximum sample size: diameter 153 mm, height 60 mm (WD=15 mm)

镜筒偏压：自动偏压转换＋固定偏压连续可变 (四偏压功能)

Drawtube voltage bias: automatic bias conversion + continuously viable fixed bias (Quad Bias-function)

应用范围

Application

可以观察和检测非均相有机、无机材料，及这些材料在纳米、微米级的表面特征。广泛应用于金属材料、高分子材料、半导体材料、地矿、宝石文物等微观形貌的研究。分析样品可以为固体、块状、片状、纤维状及粉末状。

Observation and detectection of heterogeneous organic and inorganic materials, and the surface characteristics of these materials in nanometer and/or micron scales. Widely applied in research of the microstructure of metal materials, polymer materials, semiconductor material, geology and mineral resources, precious stones, etc. Sample for analysis can be solid, block, flake, fibrous and powder.